On the second day of the global semiconductor annual conference SEMICON Taiwan 2025, Filters will present its unique global "AMC 4.0: Next-generation Micropollution Control Integration Plan", which is a complete solution covering the factory, equipment and process side. Chairman Huang Yanwen said that Filters will promote GFT-SPR technology and AMC comprehensive solution, and is expected to increase volume and contribute to growth next year.
Huang Yanwen said that filtering growth this year mainly comes from the demand for high-level AMC filter network driven by advanced process expansion, as well as the comprehensive improvement of Nanke's new factory production after-production manufacturing efficiency and supply capacity, which has led to the continuous increase in filter network shipments and market penetration. It is estimated that with the continuous increase in orders of large semiconductor factories and the introduction of new filter equipment with its own patent design, operation will be expected to increase quarter by quarter in the second half of the year.
Huang Yanwen pointed out that the AMC filter network products independently developed by Filters are currently quite extensive in advanced process applications of 2 to 10 nanometers. Since semiconductor advanced processes have extremely high requirements for AMC filter network purification and stability, as long as they are recognized, they can become a long-term partner. Since Filters are a few integrated suppliers of "AMC filter network + factory services" in Taiwan, they will gradually rebound to the 2022 level in the second half of the year.
Huang Yanwen shared that as global semiconductor processes enter the next generation, the purification of the process environment has become a key factor in determining chip yield and performance. Filters can break the traditional single-point filtering thinking, through the core GFT-SPR reaction unit filter module, and integrate multi-stage filtering systems from MAU (Make-Up Air Unit), FFU (Fan Filter Unit) to the TOOL side.
Huang Yan document explains that filters can realize the uncensored connection from the factory's new air unit (Make-Up Air Unit), production line ceiling (FFU) to the high-level process machine (TOOL terminal), and build a blind spotless ultra-pure process environment for customers. It will use GFT-SPR technology and AMC comprehensive solution to protect the clean environment of semiconductor and high-tech processes.
Huangliang article supplemented, as advanced process stages continue to evolve to 2 nanometers or below, the Critical Dimension (CD) is becoming increasingly smaller, the process environment is more sensitive to AMC pollution, and it is even more "zero tolerance" to trace pollutants. Filter-energy SPR (Surface Plasma Reaction) technology can instantly and effectively decompose harmful molecules that are difficult to remove into harmless substances.
Huang Liangwen emphasized that filters can continue to develop new composite filters and smart filter equipment, and successfully entered a number of international top-level crystalline manufacturers supply chains, accelerating the transformation from a single product filter network supplier to a solution partner for high-end industries such as semiconductors, optical power, advanced packaging testing and third-generation semiconductors, creating a clean, efficient and sustainable advanced process future.
Extended reading: Jing Ruiguang's "Three Light Module" debuted its semiconductor exhibition! Attacking unmanned machines and intelligent monitoring signs at the earliest end of the year Foresight layout of the new blue sea for micro-environment monitoring! Creative Semiconductor Show 2 Nano Process AMC Monitoring Zhongdianfeng closed in August with a 39-month high! Semiconductor show three powerful tools next year 3%